Slurry Delivery Systems
During the CMP process, it is critically important that the polishing slurries are mixed and distributed properly. The consistency, repeatability, and predictability of the CMP process requires the precision control of the polishing slurry’s specific gravity, temperature, flow rate, particle distribution in the liquid, and distribution on the polishing pad surface. Slurry delivery systems are often filled from a large day-tank and then use propellers for mixing and agitating the slurry at a controlled rate, plus peristaltic pumps or Levitronix pumps for transporting the slurry to the polishing pad surface.
More sophisticated systems can be used when pot life or chemical storage is an issue. Continuous feed systems with automatic refill capability of multiple slurry types can be valuable for larger scale manufacturing operations.
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Axus partners with Plessey Semiconductors to help bring high-performance GaN-on-Silicon monolithic microLED technology to the mass market.
Using tooling from Axus and optimised processes, Plessey Semiconductors has achieved a successful wafer to wafer bond of a 1080p microLED display 0.26” diagonal to a 3-micron pixel-pitch backplane. Much smaller than the 0.7" diagonal 8-micron pixel-pitch active-matrix display previously demonstrated.