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Slurry Delivery Systems

During the CMP process, it is critically important that the polishing slurries are mixed and distributed properly. The consistency, repeatability, and predictability of the CMP process requires the precision control of the polishing slurry’s specific gravity, temperature, flow rate, particle distribution in the liquid, and distribution on the polishing pad surface. Slurry delivery systems are often filled from a large day-tank and then use propellers for mixing and agitating the slurry at a controlled rate, plus peristaltic pumps or Levitronix pumps for transporting the slurry to the polishing pad surface.

More sophisticated systems can be used when pot life or chemical storage is an issue. Continuous feed systems with automatic refill capability of multiple slurry types can be valuable for larger scale manufacturing operations.

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NEWS AND EVENTS

 

Axus Partners with CP Display to Accelerate Monolithic 1080p MicroLED Displays to Mainstream AR

Axus partners with Compound Photonics US Corporation to accelerate sub 5 µm pixel microLED development to the mass market.

Axus and CP are partnering to integrate critical wafer-scale processes needed for mass-production scale up of CP’s 3 µm pixel, 0.26” diagonal, 1080p microLED displays for the next generation AR glasses. Specifically, Axus will deploy its state-of-the-art Capstone CMP system with integrated post-CMP clean to enable wafer planarization and surface preparation process solutions for successful wafer-scale bonding of microLED wafers to high-performance CMOS backplanes.

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Axus/Plessey Partnership

Axus partners with Plessey Semiconductors to help bring high-performance GaN-on-Silicon monolithic microLED technology to the mass market.

Using tooling from Axus and optimised processes, Plessey Semiconductors has achieved a successful wafer to wafer bond of a 1080p microLED display 0.26” diagonal to a 3-micron pixel-pitch backplane. Much smaller than the 0.7" diagonal 8-micron pixel-pitch active-matrix display previously demonstrated.

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