Slurry Delivery Systems

During the CMP process, it is critically important that the polishing slurries are mixed and distributed properly. The consistency, repeatability, and predictability of the CMP process requires the precision control of the polishing slurry’s specific gravity, temperature, flow rate, particle distribution in the liquid, and distribution on the polishing pad surface. Slurry delivery systems are often filled from a large day-tank and then use propellers for mixing and agitating the slurry at a controlled rate, plus peristaltic pumps or Levitronix pumps for transporting the slurry to the polishing pad surface.

More sophisticated systems can be used when pot life or chemical storage is an issue. Continuous feed systems with automatic refill capability of multiple slurry types can be valuable for larger scale manufacturing operations.

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