G&P 412R - AxusTech

G&P 412R

G&P Technology 412R post-CMP cleaning tool

The G&P Technology 412R post-CMP cleaning tool is a compact design that delivers state-of-the-art cleaning for 100mm to 300mm diameter substrates. Ideally suited for development applications, the 412R includes two double-side PVA brush stations, a drying station, and optional megasonic cleaning.

STANDARD FEATURES INCLUDE:

  • 100mm to 300mm wafer size
  • 2 double-sided PVA brush stations
  • Single wafer load rinse station
  • Spin rinse dry output station

OPTIONAL FEATURES:

  • Megasonic Unit for enhanced cleaning
  • Quick dump rinse (QDR-1, single tank
  • Quick dump rinse (QDR-2, recycling
  • Cleaner gripper option

DATASHEETS

Contact for

Equipment

Development Lab

Process Request Form

Request for

Parts & ServiceS