G&P Cleaner 412S

The G&P Technology 412S post-CMP cleaning tool is popular with R & D laboratories and start-up organizations who need a high quality, simple to use, single brush box, stand-alone postCMP wafer cleaning tool . The G & P Technology 412S cleaner can be configured to use the same cleaning consumables set typically used on integrated CMP planarization tools. This cleaner provides a method for using cleaning recipes similar to those used on full scale integrated production tools. This makes technology transfer seamless and facilitates shorter time-to market requirements.

STANDARD FEATURES INCLUDE:

• 100mm to 300mm wafer size
• Double-sided PVA brush
• Single wafer load rinse station
• Spin rinse dry output station

OPTIONAL FEATURES:

• Megasonic Unit for enhanced cleaning
• Quick dump rinse (QDR-1, single tank
• Quick dump rinse (QDR-2, recycling
• Cleaner gripper option

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Axus will be exhibiting at Semicon West 2020 in San Francisco, CA July 21-23, 2020

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