412S Post CMP Cleaner

The G & P Technology 412S post-CMP cleaning tool is popular with R & D laboratories and start-up organizations who need a high quality, simple to use, single brush box, stand- alone post-CMP wafer cleaning tool . The G & P Technology 412S cleaner can be configured to use the same cleaning consumables-set typically used on integrated CMP planarization tools. This cleaner provides a method for using cleaning recipes similar to those used on full scale integrated production tools. This makes technology transfer seamless and facilitates shorter time-to-market requirements.

Standard Features Includes:  412S photo from Word

  • Wafer Size Capability, 4”, 150mm, 200mm, 300mm
  • Double side scrub stations: 1
  • Brush rotation speed: 30 – 200rpm
  • Chemical inputs: 1
  • Through the brush chemical dispense
  • Spray nozzles for chemical dispense: 2
  • Rinse and Spin dry station with N2 assist
  • Single wafer manual load system
  • Intuitive touch screen control


  •  Megasonic at rinse station